SiPhotonIC ApS is a high-tech company, helping world-wide customers to design and fabricate advanced silicon photonic integrated circuits with electron-beam lithography based highly precise nano-fabrication. Our advanced technologies have achieved high-performance silicon PICs published in Science, Nature Communcations, Nano Letters, Nanoscale, Scientific Reports, and so on.

Send us your design, we will finish all the fabrication for you based on our highly precise ebeam lithography (EBL) and advanced silicon etching (ASE) based silicon nano-fabrication, and with fast delivery schedule. Typical feature size limit of our nano-fabrication: ~40nm for EBL + etching process, 50~100nm for EBL + liftoff process (depends on metal thickness), as shown below.